Bengaluru’s HHV Advanced Technologies wins SIDM award for dual ion beam system

HHV Advanced Technologies has received a SIDM Champion Award for its Dual Ion Beam Sputtering system, which the Bengaluru company said it developed for the Department of Atomic Energy’s advanced oxide thin-film work.

Defence Minister Rajnath Singh presented the award at the Society of Indian Defence Manufacturers’ eighth annual session in New Delhi on October 9. Smriti Sakhamuri, the company’s executive director and board member, and Subramanya Sastry, general manager of its Thin Film Equipment Division, accepted the award.

HHV was recognised in the category for creating niche technological capability in design, manufacturing or testing. The company said it developed the system over two years through in-house engineering and process development for strategic high-power laser applications.

HHV said research using the system recorded optical reflectivity above 99% in a specified multilayer-coating band, along with film uniformity and resistance to laser-induced damage. It added that the technology has been used in research on semiconductor surface engineering and optical coatings.

SIDM presented 15 Champion Awards across technology and industrial-development categories at the session.